29 March 2013 Double patterning: solutions in parasitic extraction
Author Affiliations +
Abstract
In this paper, we analyze advantages and disadvantages of various extraction-based techniques applied to colorless and colored double patterning layouts. Two techniques are presented: (1) an effective dielectric constant-based technique, which modifies the dielectric constants to obtain an equivalent capacitance change as would result from mask misalignment, and (2) an offset-based, less conservative technique, that proposes the use of custom corners. Experimental results illustrate the impact of double patterning on the parasitics, and allow us to compare these techniques.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dusan Petranovic, Dusan Petranovic, James Falbo, James Falbo, Nur Kurt-Karsilayan, Nur Kurt-Karsilayan, } "Double patterning: solutions in parasitic extraction", Proc. SPIE 8684, Design for Manufacturability through Design-Process Integration VII, 86840M (29 March 2013); doi: 10.1117/12.2010838; https://doi.org/10.1117/12.2010838
PROCEEDINGS
6 PAGES


SHARE
Back to Top