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Towards an integrated line edge roughness understanding: metrology, characterization, and plasma etching transfer
A new method based on AFM for the study of photoresist sidewall smoothening and LER transfer during gate patterning
Tall FIN formation for FINFET devices of 20nm and beyond using multi-cycles of passivation and etch processes
Cut-process overlay yield model for self-aligned multiple patterning and a misalignment correction technique based on dry etching
Yield enhancement of 3D flash devices through broadband brightfield inspection of the channel hole process module
The importance of lithography and advanced etch techniques for nanofabrication of MOS capacitor with HfO2