28 June 2013 Fuzzy pattern matching techniques for photomask layout data
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Proceedings Volume 8701, Photomask and Next-Generation Lithography Mask Technology XX; 87010C (2013) https://doi.org/10.1117/12.2027851
Event: Photomask and NGL Mask Technology XX, 2013, Yokohama, Japan
Pattern matching seems to be promising technique to the mask industry. It can be used for many applications such as hot spot detection of post-OPC data, search of AIMS reference location or CDSEM measurement point extraction. In particular, fuzzy pattern matching is more needed for mask data processing because the mask layout has different derivatives generated by OPC and there are many similar "OPC brothers" that come from the same layout. However, application of fuzzy pattern matching to the mask layout is challenging due to the reasons related to the characteristics of photomask data. In this paper we introduce a novel method of fuzzy pattern matching to cope with the issues that comes from the characteristics of mask data. The rule specification is quite simple - we only need to specify a single tolerance value for each edge displacement. We will show the experimental results using the actual mask layout and prove that the calculation speed and quality of the proposed technique is satisfactory from the view point of realistic MDP processing.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kokoro Kato, Kokoro Kato, Yoshiyuki Taniguchi, Yoshiyuki Taniguchi, Kuninori Nishizawa, Kuninori Nishizawa, "Fuzzy pattern matching techniques for photomask layout data", Proc. SPIE 8701, Photomask and Next-Generation Lithography Mask Technology XX, 87010C (28 June 2013); doi: 10.1117/12.2027851; https://doi.org/10.1117/12.2027851


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