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28 June 2013 Verification: an enabler for model based data preparation
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Proceedings Volume 8701, Photomask and Next-Generation Lithography Mask Technology XX; 87010E (2013) https://doi.org/10.1117/12.2032321
Event: Photomask and NGL Mask Technology XX, 2013, Yokohama, Japan
Abstract
With the technology node progress, the requirements on mask data preparation become more and more stringent. Standard long range dose modulation starts showing difficulties to meet the specifications in terms of correction accuracy and the so called Model Based Data Preparation (MBDP) is gaining more and more interest in order to maintain the required pattern fidelity. This type of correction which often includes a geometry change on top of the dose modulation cannot be checked conventionally using standard Mask Rule Check software tools. A new methodology and software tool to perform verification after Model Based e-beam Proximity Correction is presented to overcome this issue. A basic functionality is to do verification at the shot level taking into account the possible movement of the edges as well as the dose assignment. A second brick allows going one step further: a Model-Based Verification is performed all over the edges of the design, checking by simulation the deviation of the printed pattern to the target after correction. The verification tool is capable to identify hot spots as well as deviations to the targeted design occurring with a very low frequency, making it almost impossible to spot without the systematic use of a verification tool. The verification can be inserted either in the maskshop flow or at the semiconductor manufacturer as a help for improving the OPC flow or as an complementary check to be run with the OPC check.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Patrick Schiavone, Alexandre Chagoya, Luc Martin, Vincent Annezo, and Alexis Blanchemain "Verification: an enabler for model based data preparation", Proc. SPIE 8701, Photomask and Next-Generation Lithography Mask Technology XX, 87010E (28 June 2013); https://doi.org/10.1117/12.2032321
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