28 June 2013 Development of the CLIOS G821 system for inspection of LSPM for high-definition FPDs
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Proceedings Volume 8701, Photomask and Next-Generation Lithography Mask Technology XX; 87010J (2013) https://doi.org/10.1117/12.2029106
Event: Photomask and NGL Mask Technology XX, 2013, Yokohama, Japan
Lasertec has developed CLIOS G821, a new inspection system designed to inspect finely-patterned large-size photomasks used for production of high-definition FPDs. CLIOS G821 is a highly advanced successor to 51MD, which has been acclaimed as a de facto industry standard of inspection tools for the 8th generation large-size photomasks. Photomasks are becoming more and more finely patterned due to the high demand for higher quality displays driven by strong sales in smartphones as well as the introduction of the latest 4K2K HDTV format. They are also becoming more complex and advanced by the use of half-toned masks and grey-toned masks. At the frontline of production, there is a strong need for a high-sensitivity inspection tool that is capable of detecting defects on the finely-patterned and highly-advanced photomasks. In order to meet such a need, Lasertec has redesigned optics, stage mechanism and detection circuit for CLIOS G821, offering high-sensitivity and high-throughput inspection for finely-patterned and highly-advanced photomasks. The presentation will describe the superior performance and functions of CLIOS G821 in comparison to our previous model, 51MD.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Makoto Takano, Makoto Takano, Mitsuru Hamakawa, Mitsuru Hamakawa, Masahiro Toriguchi, Masahiro Toriguchi, Shinya Kuroda, Shinya Kuroda, Atsushi Tajima, Atsushi Tajima, "Development of the CLIOS G821 system for inspection of LSPM for high-definition FPDs", Proc. SPIE 8701, Photomask and Next-Generation Lithography Mask Technology XX, 87010J (28 June 2013); doi: 10.1117/12.2029106; https://doi.org/10.1117/12.2029106

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