Quality enhancement of parallel MDP flows with mask suppliers

Erwin Deng; Rachel Lee; Chun Der Lee

doi:10.1117/12.2028297

28 June 2013 Quality enhancement of parallel MDP flows with mask suppliers

Erwin Deng, Rachel Lee, Chun Der Lee

Proceedings Volume 8701, Photomask and Next-Generation Lithography Mask Technology XX; 87010L (2013) https://doi.org/10.1117/12.2028297
Event: Photomask and NGL Mask Technology XX, 2013, Yokohama, Japan

Abstract

For many maskshops, designed parallel mask data preparation (MDP) flows accompanying with a final data comparison are viewed as a reliable method that could reduce quality risks caused by mis-operation. However, in recent years, more and more mask data mistakes have shown that present parallel MDP flows could not capture all mask data errors yet. In this paper, we will show major failure models of parallel MDP flows from analyzing MDP quality accidents and share our approaches to achieve further improvement with mask suppliers together.

Citation Download Citation

Erwin Deng, Rachel Lee, and Chun Der Lee "Quality enhancement of parallel MDP flows with mask suppliers", Proc. SPIE 8701, Photomask and Next-Generation Lithography Mask Technology XX, 87010L (28 June 2013); https://doi.org/10.1117/12.2028297

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