Development of optical system on novel Projection Electron Microscopy (PEM) for EUV masks and its basic performance evaluation

Masahiro Hatakeyama; Takeshi Murakami; Kenji Terao; Kenji Watanabe; Yoshihiko Naito; Tsuyoshi Amano; Ryoichi Hirano; Susumu Iida; Tsuneo Terasawa; Hidehiro Watanabe

doi:10.1117/12.2030647

28 June 2013 Development of optical system on novel Projection Electron Microscopy (PEM) for EUV masks and its basic performance evaluation

Masahiro Hatakeyama, Takeshi Murakami, Kenji Terao, Kenji Watanabe, Yoshihiko Naito, Tsuyoshi Amano, Ryoichi Hirano, Susumu Iida, Tsuneo Terasawa, Hidehiro Watanabe

Author Affiliations +

Proceedings Volume 8701, Photomask and Next-Generation Lithography Mask Technology XX; 87010S (2013) https://doi.org/10.1117/12.2030647
Event: Photomask and NGL Mask Technology XX, 2013, Yokohama, Japan

Abstract

In order to realize pattern defect inspection for 1Xnm EUV mask, we are developing a novel projection electron microscopy (PEM) system; which enables us to make the inspection in high resolution and high throughput as compared with conventional DUV and EB inspection systems. To achieve the specification target, e.g., sensitivity of 16nm size in pattern defect and inspection speed of 19 hours/100mm square, we have examined to clear the required progress as compared to the current optical system for PEM; In order to meet the required progress, we made a new design concept and developed a new optical system, which comprises an exposure and an imaging electron optics. In this paper, we describe the evaluation on the basic performance of the developed optical system as concerning to the required progress: 1) transmittances over 10 times on the developed exposure optics and over 2 times on the developed imaging optics; 2) electron imaging being higher energy over 5 times and MTF inclination in hp44～64nm L/S pattern. The results show the developed optical system on the novel PEM is capable to meet the progress for 1Xnm EUV mask inspection.

Citation Download Citation

Masahiro Hatakeyama, Takeshi Murakami, Kenji Terao, Kenji Watanabe, Yoshihiko Naito, Tsuyoshi Amano, Ryoichi Hirano, Susumu Iida, Tsuneo Terasawa, and Hidehiro Watanabe "Development of optical system on novel Projection Electron Microscopy (PEM) for EUV masks and its basic performance evaluation", Proc. SPIE 8701, Photomask and Next-Generation Lithography Mask Technology XX, 87010S (28 June 2013); https://doi.org/10.1117/12.2030647

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
8 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Inspection

Transmittance

Imaging systems

Extreme ultraviolet

Integrated optics

Modulation transfer functions

Electron microscopy

Show All Keywords

Keywords/Phrases

Search In:

Publication Years