4 June 2013 Recent advancements in anti-reflective surface structures (ARSS) for near- to mid-infrared optics
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Abstract
Fused silica, YAG crystals, and spinel ceramics substrates have been successfully patterned through reactive ion etching (RIE). Reflection losses as low as 0.1% have been demonstrated for fused silica at 1.06 microns. Laser damage thresholds have been measured for substrates with ARSS and compared with uncoated and/or thin-film anti-reflection (AR) coated substrates. Thresholds as high as 100 J/cm2 have been demonstrated in fused silica with ARSS at 1.06 microns, with ARSS substrates showing improved thresholds when compared with uncoated substrates.
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Catalin M. Florea, Lynda E. Busse, Shyam S. Bayya, Brandon Shaw, Ish D. Aggarwal, Jas S. Sanghera, "Recent advancements in anti-reflective surface structures (ARSS) for near- to mid-infrared optics", Proc. SPIE 8708, Window and Dome Technologies and Materials XIII, 87080P (4 June 2013); doi: 10.1117/12.2016080; https://doi.org/10.1117/12.2016080
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