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29 May 2013 A process for co-molding a visible-wavelength photonic crystal and microfluidic channel for biosensing applications
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Rapid DNA analysis systems show promise for reduced DNA analysis times and can be used by untrained operators in point-of-use applications. Throughput improvements can be gained by reducing the polymerase chain reaction (PCR) cycle count, which is used in conventional DNA processing to amplify the DNA to an easily measurable amount. A Photonic Crystal (PhC) can be integrated within a microfluidic channel to enhance fluorescence emission, enabling a reduction in PCR cycling. Most PhCs are fabricated using serial top-down fabrication techniques, resulting in a structure that is challenging to integrate with microfluidic system components. Here, we present a co-integration process for fabricating a Silicon master mold consisting of a visible range PhC lattice and a microfluidic channel. This process can be used to co-fabricate microscale channel and nanoscale lattice structures in polymer or thermoplastic materials. Two dimensional visible range PhCs are fabricated by patterning electron beam resist via E-Beam Lithography (EBL). The patterned features (100-300nm features with 200-450nm pitch) are cured to a glass-like material that is used as a direct etch mask for Reactive Ion Etching. A 200μm wide and 25μm high ridge “strip” is fabricated around the PhC region using Photolithography and Deep RIE etching to form the completed channel and lattice mold. Results indicating the quality of nanoscale features resulting from the molding process in Polydimethylsiloxane (PDMS) will be discussed.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Maurya Srungarapu, Chloe E. Snyder, Anand Kadiyala, Bashar Hamza, Yuxin Liu, and Jeremy M. Dawson "A process for co-molding a visible-wavelength photonic crystal and microfluidic channel for biosensing applications", Proc. SPIE 8722, Fiber Optic Sensors and Applications X, 87220Y (29 May 2013);


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