29 May 2013 Subwavelength resonant nanostructured films for sensing
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Abstract
We present a novel subwavelength nanostructure architecture that may be utilized for optical standoff sensing applications. The subwavelength structures are fabricated via a combination of nanoimprint lithography and metal sputtering to create metallic nanostructured films encased within a transparent media. The structures are based on the open ring resonator (ORR) architecture which has a characteristic resonance frequency. Any perturbation of the nanostructured films due to chemical or environmental effects can shift the resonant frequency and provide an indication of the external stimulus. This shift in resonance can be interrogated remotely either actively using either laser illumination or passively using hyperspectral or multispectral sensing. These structures may be designed to be either anisotropic or isotropic, which can also provide polarization-sensitive interrogation. Due to the nanometer scale of the structures, they can be tailored to be optically responsive in the visible or near infrared spectrum with a highly reflective resonant peak that is dependent solely on structural dimensions and material characteristics. We present experimental measurements of the optical response of these structures as a function of wavelength, polarization, and incident angle demonstrating the resonant effect in the near infrared region. Numerical modeling data showing the effect of different fabrication parameters such as structure parameters are also discussed.
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K. J. Alvine, B. E. Bernacki, J. D. Suter, W. D. Bennett, D. J. Edwards, A. Mendoza, "Subwavelength resonant nanostructured films for sensing", Proc. SPIE 8725, Micro- and Nanotechnology Sensors, Systems, and Applications V, 87252H (29 May 2013); doi: 10.1117/12.2016547; https://doi.org/10.1117/12.2016547
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