31 January 2013 Characterization of nanoline based on SEM images
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Proceedings Volume 8759, Eighth International Symposium on Precision Engineering Measurement and Instrumentation; 87594S (2013) https://doi.org/10.1117/12.2014506
Event: International Symposium on Precision Engineering Measurement and Instrumentation 2012, 2012, Chengdu, China
Abstract
In this paper, nanolines are fabricated on photoresist using electron beam lithography (EBL) technique. The trapeziform of the cross-section is studied through analysis of the top-down scan electron microscope (SEM) image of the nanolines. Width is not adequate to describe the nanolines. From the SEM image it can be observed that the edge of the nanolines is not straight. Fractal dimension is used to describe the line-edge roughness (LER) of the nanolines. Three different methods are used to calculate the width of the nanolines. Comparing three different values and uncertainty, the true value of the nanolines has been found.
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Chen-ying Wang, Shu-ming Yang, Qi-jing Lin, Zhuang-de Jiang, "Characterization of nanoline based on SEM images", Proc. SPIE 8759, Eighth International Symposium on Precision Engineering Measurement and Instrumentation, 87594S (31 January 2013); doi: 10.1117/12.2014506; https://doi.org/10.1117/12.2014506
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