22 June 2013 Pixel length calibration using a pattern matching method for secondary-electron images
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Proceedings Volume 8769, International Conference on Optics in Precision Engineering and Nanotechnology (icOPEN2013); 876909 (2013) https://doi.org/10.1117/12.2021086
Event: International Conference on Optics in Precision Engineering and Nanotechnology (icOPEN2013), 2013, Singapore, Singapore
Abstract
We developed a calibration method using a pattern matching method for the SEM equipped with laser interferometer units at an X-Y sample stage. By comparing two images captured before and after the stage movement, an each of moving pixel number to X and Y direction were analyzed using the image processing technique. Then the pixel length was calibrated using stage position data and the pixel data. The developed calibration methods were applied to nano-particle measurements. The sample particle sizes were nominal diameter of 100 nm and 300 nm. Measurement uncertainty evaluation was done and quantitatively reliable results were obtained.
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Kentaro Sugawara, Ichiko Misumi, Satoshi Gonda, "Pixel length calibration using a pattern matching method for secondary-electron images", Proc. SPIE 8769, International Conference on Optics in Precision Engineering and Nanotechnology (icOPEN2013), 876909 (22 June 2013); doi: 10.1117/12.2021086; https://doi.org/10.1117/12.2021086
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