You have requested a machine translation of selected content from our databases. This functionality is provided solely for your convenience and is in no way intended to replace human translation. Neither SPIE nor the owners and publishers of the content make, and they explicitly disclaim, any express or implied representations or warranties of any kind, including, without limitation, representations and warranties as to the functionality of the translation feature or the accuracy or completeness of the translations.
Translations are not retained in our system. Your use of this feature and the translations is subject to all use restrictions contained in the Terms and Conditions of Use of the SPIE website.
22 June 2013Pixel length calibration using a pattern matching method for secondary-electron images
We developed a calibration method using a pattern matching method for the SEM equipped with laser
interferometer units at an X-Y sample stage. By comparing two images captured before and after the stage movement, an
each of moving pixel number to X and Y direction were analyzed using the image processing technique. Then the pixel
length was calibrated using stage position data and the pixel data.
The developed calibration methods were applied to nano-particle measurements. The sample particle sizes were
nominal diameter of 100 nm and 300 nm. Measurement uncertainty evaluation was done and quantitatively reliable
results were obtained.
Kentaro Sugawara,Ichiko Misumi, andSatoshi Gonda
"Pixel length calibration using a pattern matching method for secondary-electron images", Proc. SPIE 8769, International Conference on Optics in Precision Engineering and Nanotechnology (icOPEN2013), 876909 (22 June 2013); https://doi.org/10.1117/12.2021086
The alert did not successfully save. Please try again later.
Kentaro Sugawara, Ichiko Misumi, Satoshi Gonda, "Pixel length calibration using a pattern matching method for secondary-electron images," Proc. SPIE 8769, International Conference on Optics in Precision Engineering and Nanotechnology (icOPEN2013), 876909 (22 June 2013); https://doi.org/10.1117/12.2021086