Photo-thermal modifications in ultrafast laser inscribed chalcogenide glass waveguides

Gayathri Sivakumar; Tamilarasan Sabapathy; Arunbabu Ayiriveetil; Ajoy K. Kar; Sundarrajan Asokan

doi:10.1117/12.2018943

22 June 2013 Photo-thermal modifications in ultrafast laser inscribed chalcogenide glass waveguides

Gayathri Sivakumar, Tamilarasan Sabapathy, Arunbabu Ayiriveetil, Ajoy K. Kar, Sundarrajan Asokan

Proceedings Volume 8769, International Conference on Optics in Precision Engineering and Nanotechnology (icOPEN2013); 87692L (2013) https://doi.org/10.1117/12.2018943
Event: International Conference on Optics in Precision Engineering and Nanotechnology (icOPEN2013), 2013, Singapore, Singapore

Abstract

We report here, a finite difference thermal diffusion (FDTD) model for controlling the cross-section and the guiding nature of the buried channel waveguides fabricated on GeGaS bulk glasses using the direct laser writing technique. Optimization of the laser parameters for guiding at wavelength 1550 nm is done experimentally and compared with the theoretical values estimated by FDTD model. The mode field diameter (MFD) between 5.294 μm and 24.706 μm were attained by suitable selection of writing speed (1mm/s to 4 mm/s) and pulse energy (623 nJ to 806 nJ) of the laser at a fixed repletion rate of 100 kHz. Transition from single-mode to multi-mode waveguide is observed at pulse energy 806nJ as a consequence of heat accumulation. The thermal diffusion model fits well for single-mode waveguides with the exception of multi-mode waveguides.

Citation Download Citation

Gayathri Sivakumar, Tamilarasan Sabapathy, Arunbabu Ayiriveetil, Ajoy K. Kar, and Sundarrajan Asokan "Photo-thermal modifications in ultrafast laser inscribed chalcogenide glass waveguides", Proc. SPIE 8769, International Conference on Optics in Precision Engineering and Nanotechnology (icOPEN2013), 87692L (22 June 2013); https://doi.org/10.1117/12.2018943

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