8 May 2013 Investigations of the behavior for PQ-PMMA material post-exposure
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Abstract
Phenanthreneauinone (PQ) doped poly(methyl methacrylate) (PMMA) photopoplymer material has been actively investigated in the literature. Based on the previously developed NPDD model and the analysis of the mechanisms, the behavior of the material is being further studied. The first harmonic refractive index modulation has been examined for both long time post-exposure and under thermal treatment. Twelve and four spatial concentration harmonics in the Fourier series expansions are applied respectively for comparison. Several effects, i.e., the non-local effect, the diffusion of both the ground state and excited states PQ molecules, which occur during and post-exposure in PQ-PMMA photopolymer materials, have been studied under thermal treatment. For long time post-exposure or when the heating treatment is applied, the formation of the photoproduct, PQ/PMMA, has become very important. The effects of nonlocality, diffusion and the different exposing intensities on the distribution of PQ/PMMA over space and higher harmonic PQ/PMMA concentration have been shown. The experimental results are presented, where no thermal treatment is applied.
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Yue Qi, Yue Qi, Haoyu Li, Haoyu Li, Elen Tolstik, Elen Tolstik, Jinxin Guo, Jinxin Guo, Michael R. Gleeson, Michael R. Gleeson, Vladislav Matusevich, Vladislav Matusevich, Richard Kowarschik, Richard Kowarschik, John T. Sheridan, John T. Sheridan, "Investigations of the behavior for PQ-PMMA material post-exposure", Proc. SPIE 8776, Holography: Advances and Modern Trends III, 877606 (8 May 2013); doi: 10.1117/12.2018243; https://doi.org/10.1117/12.2018243
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