3 May 2013 Application of EUV optics to surface modification of materials
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Abstract
We report results of experiments connected with surface modification of materials with an intense extreme ultraviolet (EUV) laser beam. Irradiated by the laser beam from a discharge-plasma EUV source (with wavelength of 46.9 nm) based on a high-current capillary discharge driver, the samples have been investigated by atomic-force microscope (AFM). The laser beam is focused with a spherical Si/Sc multilayer-coated mirror on polymethylmethacrylate (PMMA), gold-covered- PMMA and gallium arsenide (GaAs) samples. It turned out that desorption and ablation regimes, which are observed in all these cases strongly depends on substrate materials.
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O. Frolov, K. Kolacek, J. Straus, J. Schmidt, V. Prukner, A. Choukourov, "Application of EUV optics to surface modification of materials", Proc. SPIE 8777, Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III, 877707 (3 May 2013); doi: 10.1117/12.2020158; https://doi.org/10.1117/12.2020158
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