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3 May 2013 Application of EUV optics to surface modification of materials
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We report results of experiments connected with surface modification of materials with an intense extreme ultraviolet (EUV) laser beam. Irradiated by the laser beam from a discharge-plasma EUV source (with wavelength of 46.9 nm) based on a high-current capillary discharge driver, the samples have been investigated by atomic-force microscope (AFM). The laser beam is focused with a spherical Si/Sc multilayer-coated mirror on polymethylmethacrylate (PMMA), gold-covered- PMMA and gallium arsenide (GaAs) samples. It turned out that desorption and ablation regimes, which are observed in all these cases strongly depends on substrate materials.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
O. Frolov, K. Kolacek, J. Straus, J. Schmidt, V. Prukner, and A. Choukourov "Application of EUV optics to surface modification of materials", Proc. SPIE 8777, Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III, 877707 (3 May 2013);

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