3 May 2013 Characterizing the focus of a multilayer coated off-axis parabola for FLASH beam at λ = 4.3 nm
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Abstract
A super-polished substrate with an off-axis parabola figure was coated with a Sc/B4C/Cr multilayer. This optic was used to focus pulses of 4.3 nm photons from the Free-electron LASer in Hamburg (FLASH) at normal incidence. Beam imprints were made in poly(methyl methacrylate) to align the optic and to measure the beam profile at the focal plane. The intense interaction resulted in imprints with raised perimeters, surrounded by ablated material extending out several micrometres. These features interfere with the beam profile measurement. The effect of a post-exposure development step on the beam imprints was investigated.
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Adam F. G. Leontowich, Andrew Aquila, Francesco Stellato, Richard Bean, Holger Fleckenstein, Mauro Prasciolu, Mengning Liang, Daniel P. DePonte, Anton Barty, Fenglin Wang, Jakob Andreasson, Janos Hajdu, Henry N. Chapman, Saša Bajt, "Characterizing the focus of a multilayer coated off-axis parabola for FLASH beam at λ = 4.3 nm", Proc. SPIE 8777, Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III, 87770T (3 May 2013); doi: 10.1117/12.2022403; https://doi.org/10.1117/12.2022403
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