10 May 2013 Full characterization of a focused wave field with sub 100 nm resolution
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Abstract
A hard x-ray free-electron laser (XFEL) provides an x-ray source with an extraordinary high peak-brilliance, a time structure with extremely short pulses and with a large degree of coherence, opening the door to new scientific fields. Many XFEL experiments require the x-ray beam to be focused to nanometer dimensions or, at least, benefit from such a focused beam. A detailed knowledge about the illuminating beam helps to interpret the measurements or is even inevitable to make full use of the focused beam. In this paper we report on focusing an XFEL beam to a transverse size of 125nm and how we applied ptychographic imaging to measure the complex wavefield in the focal plane in terms of phase and amplitude. Propagating the wavefield back and forth we are able to reconstruct the full caustic of the beam, revealing aberrations of the nano-focusing optic. By this method we not only obtain the averaged illumination but also the wavefield of individual XFEL pulses.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert Hoppe, Vivienne Meier, Jens Patommel, Frank Seiboth, Hae Ja Lee, Bob Nagler, Eric C. Galtier, Brice Arnold, Ulf Zastrau, Jerome Hastings, Daniel Nilsson, Fredrik Uhlén, Ulrich Voigt, Hans M. Hertz, Christian G. Schroer, Andreas Schropp, "Full characterization of a focused wave field with sub 100 nm resolution", Proc. SPIE 8778, Advances in X-ray Free-Electron Lasers II: Instrumentation, 87780G (10 May 2013); doi: 10.1117/12.2020856; https://doi.org/10.1117/12.2020856
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