Effect of laser conditioning on the LIDT of 532nm HfO2/SiO2 thin films reflectors

Jie Liu; Xu Li; Zhenkun Yu; Hui Cui; Weili Zhang; Meiping Zhu; Kui Yi

doi:10.1117/12.2020439

9 July 2013 Effect of laser conditioning on the LIDT of 532nm HfO₂/SiO₂ reflectors

Jie Liu, Xu Li, Zhenkun Yu, Hui Cui, Weili Zhang, Meiping Zhu, Kui Yi

Proceedings Volume 8786, Pacific Rim Laser Damage 2013: Optical Materials for High Power Lasers; 87860Z (2013) https://doi.org/10.1117/12.2020439
Event: SPIE/SIOM Pacific Rim Laser Damage: Optical Materials for High-Power Lasers, 2013, Shanghai, China

Abstract

The laser-induced damage threshold (LIDT) of optical thin film is influenced by certain preconditioning processes. HfO₂/SiO₂ 532nm high reflective multi-layers were prepared by electron beam evaporation and were preconditioned by 532nm laser. The 532nm LIDT, surface condition, and damage morphology of the sample were characterized and compared before and after laser conditioning process. Results are presented that the LIDT of e-beam deposited multilayer HfO₂/SiO₂ thin films can be increased after laser conditioning. Possible reasons for such enhancement have been analyzed.

Citation Download Citation

Jie Liu, Xu Li, Zhenkun Yu, Hui Cui, Weili Zhang, Meiping Zhu, and Kui Yi "Effect of laser conditioning on the LIDT of 532nm HfO₂/SiO₂ reflectors", Proc. SPIE 8786, Pacific Rim Laser Damage 2013: Optical Materials for High Power Lasers, 87860Z (9 July 2013); https://doi.org/10.1117/12.2020439

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