Laser-induced damage resistance of AlF3 films

Jian Sun; Xu Li; Weili Zhang; Kui Yi; Jianda Shao

doi:10.1117/12.2020278

9 July 2013 Laser-induced damage resistance of AlF₃ films

Jian Sun, Xu Li, Weili Zhang, Kui Yi, Jianda Shao

Proceedings Volume 8786, Pacific Rim Laser Damage 2013: Optical Materials for High Power Lasers; 878620 (2013) https://doi.org/10.1117/12.2020278
Event: SPIE/SIOM Pacific Rim Laser Damage: Optical Materials for High-Power Lasers, 2013, Shanghai, China

Abstract

AlF₃ thin films were prepared by thermal evaporation at different substrate temperatures and deposition rates. The relationships between optical properties, mechanical properties and laser-induced damage threshold (LIDT) at 355nm of AlF₃ films were discussed. Both absorption and stress increased with increasing substrate temperatures and deposition rates, which was a disadvantage to laser-induced damage resistance. Meanwhile, interfacial adhesion and hardness increased with substrate temperatures and deposition rates, which was an advantage to enhance the LIDT. The LIDT increased from room temperature to 200°C duo to increasing interfacial adhesion and hardness, and then decreased to 300°C duo to increasing absorption and stress. The LIDT decreased with deposition rates due to increasing absorption and stress.

Citation Download Citation

Jian Sun, Xu Li, Weili Zhang, Kui Yi, and Jianda Shao "Laser-induced damage resistance of AlF₃ films", Proc. SPIE 8786, Pacific Rim Laser Damage 2013: Optical Materials for High Power Lasers, 878620 (9 July 2013); https://doi.org/10.1117/12.2020278

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