13 May 2013 Nanometrology of periodic nanopillar arrays by means of light scattering
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We report on a fast and accurate shape metrology for nanoscale structures by analyzing the scattering pattern of visible light. The technique is based on model-based scatterometry which is inverse measurement technique comparing measured scattering data with numerical simulations of the scattering process using a physical model of the structures. We demonstrate the concept for an array of silicon nanopillars that are arranged in a twodimensional lattice and show that the proposed methodology provides a fast and reliable determination of the pillar dimensions with nanometer precision. Since the technique works contact-free and is applicable to large area samples, it can be readily implemented in an industrial environment for inline metrology applications.
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Oliver Paul, Oliver Paul, Frank Widulle, Frank Widulle, Bernd H. Kleemann, Bernd H. Kleemann, Andreas Heinrich, Andreas Heinrich, } "Nanometrology of periodic nanopillar arrays by means of light scattering", Proc. SPIE 8788, Optical Measurement Systems for Industrial Inspection VIII, 87881O (13 May 2013); doi: 10.1117/12.2020880; https://doi.org/10.1117/12.2020880

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