13 May 2013 Nanometrology of periodic nanopillar arrays by means of light scattering
Author Affiliations +
Abstract
We report on a fast and accurate shape metrology for nanoscale structures by analyzing the scattering pattern of visible light. The technique is based on model-based scatterometry which is inverse measurement technique comparing measured scattering data with numerical simulations of the scattering process using a physical model of the structures. We demonstrate the concept for an array of silicon nanopillars that are arranged in a twodimensional lattice and show that the proposed methodology provides a fast and reliable determination of the pillar dimensions with nanometer precision. Since the technique works contact-free and is applicable to large area samples, it can be readily implemented in an industrial environment for inline metrology applications.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Oliver Paul, Oliver Paul, Frank Widulle, Frank Widulle, Bernd H. Kleemann, Bernd H. Kleemann, Andreas Heinrich, Andreas Heinrich, } "Nanometrology of periodic nanopillar arrays by means of light scattering", Proc. SPIE 8788, Optical Measurement Systems for Industrial Inspection VIII, 87881O (13 May 2013); doi: 10.1117/12.2020880; https://doi.org/10.1117/12.2020880
PROCEEDINGS
7 PAGES


SHARE
Back to Top