13 May 2013 Scatterometry sensitivity analysis for conical diffraction versus in-plane diffraction geometry with respect to the side wall angle
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Abstract
Extreme W scatterometry using radiation in the extreme ultraviolet photon energy range, with wavelengths around 13.5 nm, provides direct information on the performance of EUV optical components, e.g. EUV pho­ tomasks, in their working wavelength regime. Scatterometry with horizontal diffraction geometry, parallel to the grating lines (conical), and vertical scattering geometry, perpendicular to the lines (in-plane), was performed on EUV lithography mask test structures. Numerical FEM based simulations, using a rigorous Maxwell solver, compare both experimental set-ups with focus on the sensitivity of the diffraction intensities particularly with respect to the side wall angle.
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Victor Soltwisch, Victor Soltwisch, Sven Burger, Sven Burger, Frank Scholze, Frank Scholze, } "Scatterometry sensitivity analysis for conical diffraction versus in-plane diffraction geometry with respect to the side wall angle", Proc. SPIE 8789, Modeling Aspects in Optical Metrology IV, 878905 (13 May 2013); doi: 10.1117/12.2020487; https://doi.org/10.1117/12.2020487
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