13 May 2013 The effect of line roughness on DUV scatterometry
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Abstract
The impact of line-edge (LER) and line-width roughness (LWR) on the measured diffraction patters in extreme ultraviolet (EUV) scatterometry has been investigated in recent publications. Two-dimensional rigorous numerical simulations were carried out to model roughness. Simple analytical expressions for the bias in the mean efficiencies stemming from LER and LWR were obtained. Applying a similar approach for DUV scatterometry to investigate the impact of line roughness we obtain comparable results.
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Mark-Alexander Henn, Mark-Alexander Henn, Sebastian Heidenreich, Sebastian Heidenreich, Hermann Gross, Hermann Gross, Bernd Bodermann, Bernd Bodermann, Markus Bär, Markus Bär, } "The effect of line roughness on DUV scatterometry", Proc. SPIE 8789, Modeling Aspects in Optical Metrology IV, 87890U (13 May 2013); doi: 10.1117/12.2020761; https://doi.org/10.1117/12.2020761
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