13 May 2013 The effect of line roughness on DUV scatterometry
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Abstract
The impact of line-edge (LER) and line-width roughness (LWR) on the measured diffraction patters in extreme ultraviolet (EUV) scatterometry has been investigated in recent publications. Two-dimensional rigorous numerical simulations were carried out to model roughness. Simple analytical expressions for the bias in the mean efficiencies stemming from LER and LWR were obtained. Applying a similar approach for DUV scatterometry to investigate the impact of line roughness we obtain comparable results.
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Mark-Alexander Henn, Mark-Alexander Henn, Sebastian Heidenreich, Sebastian Heidenreich, Hermann Gross, Hermann Gross, Bernd Bodermann, Bernd Bodermann, Markus Bär, Markus Bär, "The effect of line roughness on DUV scatterometry", Proc. SPIE 8789, Modeling Aspects in Optical Metrology IV, 87890U (13 May 2013); doi: 10.1117/12.2020761; https://doi.org/10.1117/12.2020761
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