13 May 2013 Super-resolution imaging based on liquid crystal on silicon displays technology
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Abstract
Two different techniques, based on Liquid Crystal on Silicon technology, are proposed in this work to obtain superresolved images of an object. Whereas one of the methods is based on a structured illumination of the object, the second one achieves super-resolution by generating different sub-pixel displacements of the object image. In the first approach, object is simultaneously illuminated with different tilted beams, coding different information of the object. Different tilted beams, generated by means of the LCoS display, produce an on-axis interferometry scheme. By adding different combinations of constant phases at the generated beams, different interferograms are acquired. Using proper selection of constant phases for each of the interferograms, the synthetic aperture can be calculated. To this aim, a post processing is applied, where Fourier transforms of each interferogram is calculated, and where each portion of the object spectrum is spatially shifted at its correct position. Finally, by combining all the portions of the object spectrum, and by applying inverse Fourier transform of the synthesized spectrum, a super-resolved image of the object is achieved. In the second approach, Liquid Crystal on Silicon display is used to generate different linear phases at the object spectral plane, leading to different sub-pixel displacements of the object image at the image plane. In this way, images of the same object with different shifts are sampled by Charge-Coupled Device camera. Finally, by properly combining the different images obtained, an image with larger resolution than the original one is achieved. Experimental results obtained for the two proposed techniques are also provided in this work, confirming their usefulness to obtain super-resolved images.
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A. Hussain, M. Sohail, J. L. Martínez, A. Lizana, A. Márquez, J. Campos, "Super-resolution imaging based on liquid crystal on silicon displays technology", Proc. SPIE 8789, Modeling Aspects in Optical Metrology IV, 878918 (13 May 2013); doi: 10.1117/12.2020608; https://doi.org/10.1117/12.2020608
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