16 May 2013 Offset-central-wavelength multilayer films reflector for high energy laser beam diagnosis
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Proceedings Volume 8796, 2nd International Symposium on Laser Interaction with Matter (LIMIS 2012); 87961Y (2013) https://doi.org/10.1117/12.2011111
Event: 2nd International Symposium on Laser Interaction with Matter (LIMIS 2012), 2012, Xi'an, Shaanxi, China
Abstract
In the development of high energy laser (HEL) beam diagnostic equipment with optical attenuation by dielectric multilayer films reflector, in order to fulfill the sampling uncertainty request of the system, the transmittance of the attenuator should keep as a constant or only vary in a small range when the incident angle of laser changes. To address this, we analyzed the principle of the conventional dielectric multilayer films reflector and put forward a new and simple offset-central-wavelength multilayer films reflector (OCWMFR) involving no change of the dielectric multilayer films materials and basic fabrication process. Theoretical simulation and experimental results show that the reflector has a good transmittance consistency and can meet the attenuation and sampling requirement of HEL beam diagnosis.
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Shaowu Chen, Cuilei Yuwen, Yong Wu, Ping Wang, Mengmeng Tao, Fuhua Liu, "Offset-central-wavelength multilayer films reflector for high energy laser beam diagnosis", Proc. SPIE 8796, 2nd International Symposium on Laser Interaction with Matter (LIMIS 2012), 87961Y (16 May 2013); doi: 10.1117/12.2011111; https://doi.org/10.1117/12.2011111
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