26 September 2013 Predefined planar structures in semiconductor surfaces patterned by NSOM lithography
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Near-field scanning optical microscope (NSOM) lithography is one of optical technologies for planar structure fabrication, where exposure process is performed by optical near field produced at tip of fiber probe. Maskless exposure of defined regions is performed so that different periodic and predefined arrangement can be achieved. In this contribution, NSOM lithography is presented as effective tool for semiconductor device surface patterning. Non-contact mode of NSOM lithography was used to pattern planar predefined structures in GaAs, AlGaAs and GaP surfaces. In this way, GaAs/AlGaAs-based LED with patterned structure in the emitting surface was prepared, where patterned air holes show enhancement of radiation in comparison with the surrounding surface. Furthermore, NSOM in combination with lift-off technique was used to prepare metal-catalyst particles on GaP substrate for subsequent growth of GaP nanowires which can be used in photovoltaic applications.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ivana Lettrichova, Ivana Lettrichova, Dusan Pudis, Dusan Pudis, Agata Laurencikova, Agata Laurencikova, Stanislav Hasenohrl, Stanislav Hasenohrl, Jozef Novak, Jozef Novak, Jaroslava Skriniarova, Jaroslava Skriniarova, Jaroslav Kovac, Jaroslav Kovac, "Predefined planar structures in semiconductor surfaces patterned by NSOM lithography ", Proc. SPIE 8816, Nanoengineering: Fabrication, Properties, Optics, and Devices X, 881619 (26 September 2013); doi: 10.1117/12.2023211; https://doi.org/10.1117/12.2023211

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