Translator Disclaimer
20 September 2013 NSF nanomanufacturing program and its implications for measurement and control
Author Affiliations +
The NSF Nanomanufacturing Program supports fundamental research in novel methods and techniques for batch and continuous processes, and top-down and bottom-up processes leading to the formation of complex nanostructures, nanodevices and nanosystems. The program leverages advances in the understanding of nano-scale phenomena and processes, nanomaterials discovery, novel nanostructure architectures, innovative nanodevice and nanosystem design. It seeks to address issues such as quality, efficiency, scalability, reliability, safety and affordability. The program encourages research in the development of new nano-scale processes and production systems based on computation, modeling and simulation and use of process sensing, monitoring, and control. Research in instrumentation and metrology is an integral part of the program. Additionally, the program supports education of the next generation of researchers, and encourages building a workforce trained in nanotechnology and nanomanufacturing systems. It is also interested in understanding long-term societal implications of large-scale production and use of nano-scale materials. For this, it encourages the development of standards. This paper will describe the program philosophy.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Khershed P. Cooper "NSF nanomanufacturing program and its implications for measurement and control", Proc. SPIE 8819, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII, 88190A (20 September 2013);


Back to Top