25 September 2013 Biomimetic antireflective AlInP nanostructures fabricated by lithography-free method for solar cell applications
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Abstract
We present biomimetic antireflective AlInP nanostructures fabricated by inductively coupled plasma etching using Ag etch masks, which were easily formed by spin-coating Ag ink and subsequent sintering process on a hotplate without any lithography process and complicated equipments, for compound semiconductor based solar cell applications. This lithography-free technique is a simple, cost-effective, and high throughput method. The fabricated AlInP nanostructures demonstrated drastically reduced the hemispherical reflectance and solar-weighted reflectance (SWR) compared to that of bulk AlInP in the wavelength range of 300-870 nm. The incident angle-dependent SWR of the AlInP nanostructures remained below 4% up to an incident angle of 50°. Therefore, the biomimetic antireflective AlInP nanostructures fabricated by using the lithography-free method hold great potential for use in compound semiconductor based solar cell applications.
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Chan Il Yeo, Joon Beom Kim, Kwang Wook Park, and Yong Tak Lee "Biomimetic antireflective AlInP nanostructures fabricated by lithography-free method for solar cell applications", Proc. SPIE 8824, Next Generation (Nano) Photonic and Cell Technologies for Solar Energy Conversion IV, 88240X (25 September 2013); doi: 10.1117/12.2022507; https://doi.org/10.1117/12.2022507
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