Paper
30 September 2013 Novel rapid polishing process for fabrication of sapphire windows
Rajiv K. Singh, Arul Chakkaravarthi Arjunan, Kannan Balasundaram, Jinhyung Lee, George Ling, Deepika Singh
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Abstract
Sapphire is uniquely suitable for sensor windows of electro-optical systems due to its high transparency, high mechanical strength, and chemical inactivity. Unfortunately, these same characteristics also cause polishing of sapphire windows to be extremely difficult and slow. Hence the challenge is to develop a process for affordable production of large area sapphire windows with low-roughness, low-stress and without surface and subsurface damage. Here we report a novel rapid chemical mechanical polishing process that increases the material removal rate during polishing of sapphire by greater than twofold over conventional processes. Such a process can also produce angstrom level surface finish.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rajiv K. Singh, Arul Chakkaravarthi Arjunan, Kannan Balasundaram, Jinhyung Lee, George Ling, and Deepika Singh "Novel rapid polishing process for fabrication of sapphire windows", Proc. SPIE 8837, Material Technologies and Applications to Optics, Structures, Components, and Sub-Systems, 88370T (30 September 2013); https://doi.org/10.1117/12.2024689
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KEYWORDS
Sapphire

Surface finishing

Polishing

Silica

Chemical mechanical planarization

Particles

Chemical reactions

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