Application Of Electron-Beam Lithography At Csem For Fabricating Computer-Generated Holograms

H Buczek; J M Teijido

doi:10.1117/12.944159

24 May 1988 Application Of Electron-Beam Lithography At Csem For Fabricating Computer-Generated Holograms

H Buczek, J M Teijido

Proceedings Volume 0884, Computer-Generated Holography II; (1988) https://doi.org/10.1117/12.944159
Event: 1988 Los Angeles Symposium: O-E/LASE '88, 1988, Los Angeles, CA, United States

Abstract

This paper presents the use of a standard electron-beam lithography for the fabrication of computer-generated holograms (CGH).

Citation Download Citation

H Buczek and J M Teijido "Application Of Electron-Beam Lithography At Csem For Fabricating Computer-Generated Holograms", Proc. SPIE 0884, Computer-Generated Holography II, (24 May 1988); https://doi.org/10.1117/12.944159

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