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27 September 2013 Scanning coherent x-ray microscopy as a tool for XFEL nanobeam characterization
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Abstract
During the last years, scanning coherent x-ray microscopy, also called ptychography, has revolutionized nanobeamcharacterization at third generation x-ray sources. The method yields the complete information on the complex valued, nanofocused wave field with high spatial resolution. In an experiment carried out at the Matter in Extreme Conditions (MEC) instrument at the Linac Coherent Light Source (LCLS) we successfully applied the method to an attenuated nanofocused XFEL beam with a size of 180(h) × 150(v)nm2 (FWHM) in horizontal (h) and vertical direction (v), respectively. It was created by a set of 20 beryllium compound refractive lenses (Be-CRLs). By using a fast detector (CSPAD) to record the diffraction patterns and a fast implementation of the phase retrieval code running on a graphics processing unit (GPU), the applicability of the method as a real-time XFEL nanobeam diagnostic is highlighted.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andreas Schropp, Robert Hoppe, Jens Patommel, Frank Seiboth, Fredrik Uhlén, Ulrich Vogt, Hae Ja Lee, Bob Nagler, Eric C. Galtier, Ulf Zastrau, Brice Arnold, Philip Heimann, Jerome B. Hastings, and Christian G. Schroer "Scanning coherent x-ray microscopy as a tool for XFEL nanobeam characterization", Proc. SPIE 8849, X-Ray Lasers and Coherent X-Ray Sources: Development and Applications X, 88490R (27 September 2013); https://doi.org/10.1117/12.2024784
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