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30 September 2013 Development of coherent EUV scatterometry microscope with high-order harmonic for EUV mask inspection
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Abstract
We have developed the standalone, coherent scatterometry microscope (CSM) for the inspection of extreme ultraviolet (EUV) lithography mask. The low divergence, coherent high-order harmonic (HH) was generated as coherent light source for CSM at a wavelength of 13.5 nm using a commercial laser system. The HH enable us to obtain the high contrast diffraction image from the mask. The diffraction light from the 2-nm wide line-defect and tens-nm size point-defects in the mask has been observed successfully with the system.
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Yutaka Nagata, Tetsuo Harada, Masato Nakasuji, Hiroo Kinoshita, and Katsumi Midorikawa "Development of coherent EUV scatterometry microscope with high-order harmonic for EUV mask inspection", Proc. SPIE 8849, X-Ray Lasers and Coherent X-Ray Sources: Development and Applications X, 884914 (30 September 2013); https://doi.org/10.1117/12.2023880
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