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26 September 2013 Recent advances in use of atomic layer deposition and focused ion beams for fabrication of Fresnel zone plates for hard x-rays
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Abstract
Developments and advances in the e-beam lithography (EBL) made it possible to reach resolutions in a single digit nanometer range in the soft x-ray microscopy using Fresnel Zone Plates (FZP). However, it is very difficult to fabricate efficient FZPs for hard x-rays via this conventional fabrication technique due to limitations in the achievable aspect ratios. Here, we demonstrate the use of alternative fabrication techniques that depend on utilization of atomic layer deposition and focused ion beam processing to deliver FZPs that are efficient for the hard X-ray range.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kahraman Keskinbora, Anna-Lena Robisch, Marcel Mayer, Corinne Grévent, Adriana V. Szeghalmi, Mato Knez, Markus Weigand, Irina Snigireva, Anatoly Snigirev, Tim Salditt, and Gisela Schütz "Recent advances in use of atomic layer deposition and focused ion beams for fabrication of Fresnel zone plates for hard x-rays", Proc. SPIE 8851, X-Ray Nanoimaging: Instruments and Methods, 885119 (26 September 2013); https://doi.org/10.1117/12.2027251
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