20 September 2013 2013 mask industry survey
Author Affiliations +
Proceedings Volume 8880, Photomask Technology 2013; 88800K (2013); doi: 10.1117/12.2033255
Event: SPIE Photomask Technology, 2013, Monterey, California, United States
Abstract
A comprehensive survey was sent to merchant and captive mask shops to gather information about the mask industry as an objective assessment of its overall condition. 2013 marks the 12th consecutive year for this process. Historical topics including general mask profile, mask processing, data and write time, yield and yield loss, delivery times, maintenance, and returns were included and new topics were added. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the mask industry. While each year’s survey includes minor updates based on feedback from past years and the need to collect additional data on key topics, the bulk of the survey and reporting structure have remained relatively constant. A series of improvements is being phased in beginning in 2013 to add value to a wider audience, while at the same time retaining the historical content required for trend analyses of the traditional metrics. Additions in 2013 include topics such as top challenges, future concerns, and additional details in key aspects of mask masking, such as the number of masks per mask set per ground rule, minimum mask resolution shipped, and yield by ground rule. These expansions beyond the historical topics are aimed at identifying common issues, gaps, and needs. They will also provide a better understanding of real-life mask requirements and capabilities for comparison to the International Technology Roadmap for Semiconductors (ITRS).
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Matt Malloy, "2013 mask industry survey", Proc. SPIE 8880, Photomask Technology 2013, 88800K (20 September 2013); doi: 10.1117/12.2033255; http://dx.doi.org/10.1117/12.2033255
PROCEEDINGS
16 PAGES


SHARE
KEYWORDS
Photomasks

Binary data

Manufacturing

Optical proximity correction

Pellicles

Inspection

Phase shifts

Back to Top