9 September 2013 2013 Photomask Japan panel discussion summary: Future mask patterning technologies in the next decade: searching for the best mix solution
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Abstract
This paper gives a review and summary of the key messages from the 2013 PMJ panel discussion topic: “Future mask patterning technologies in the next decade: searching for the best mix solution." The results of the special survey conducted for the panel are reviewed along with a brief summary of each panelist’s point of view.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Noriaki Nakayamada, Noriaki Nakayamada, Ichiro Kagami, Ichiro Kagami, } "2013 Photomask Japan panel discussion summary: Future mask patterning technologies in the next decade: searching for the best mix solution", Proc. SPIE 8880, Photomask Technology 2013, 888015 (9 September 2013); doi: 10.1117/12.2032072; https://doi.org/10.1117/12.2032072
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