Paper
1 October 2013 Model-driven target optimization to resolve design hotspots through image quality enhancement
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Abstract
Model-driven target optimization using an ILT hotspot fixer is applied to line collapsing defects of 2- dimensional randomtest pattern of a very low K1 process. The target is moved by minimizing the process variation band and the pitches of hotspot points are relaxed.The image quality improvement is thenchecked. Model driven target optimized NILS and MEEF at the weakest hotspot point are improved to 1.22 and 5.5 from the values 0.79 and 10.6 of a traditional OPCwith advanced solver, respectively. The pattern collapsing hotspot is then validated to be repaired by optimizing target position. A full hotspot fixer flow including model-driven target optimization using ILT can also be extended into DFM applications.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sung-Woo Lee, Tom Cecil, Guangming Xiao, Mindy Lee, Jung-Hoe Choi, Seung-Hee Baek, Jin-Hyuck Jeon, Chan Ha Park, Dave Kim, and Kevin Lucas "Model-driven target optimization to resolve design hotspots through image quality enhancement", Proc. SPIE 8880, Photomask Technology 2013, 88801U (1 October 2013); https://doi.org/10.1117/12.2026140
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KEYWORDS
Optical proximity correction

Image quality

Optimization (mathematics)

Nanoimprint lithography

Image enhancement

Image processing

Design for manufacturing

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