10 June 2013 Fabrication of plasmonic structures on LN2 cooled substrates
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Proceedings Volume 8882, ROMOPTO 2012: Tenth Conference on Optics: Micro- to Nanophotonics III; 88820B (2013) https://doi.org/10.1117/12.2032350
Event: ROMOPTO International Conference on Micro- to Nano-Photonics III, 2012, Bucharest, Romania
Abstract
This research is motivated by our interest in fabrication of plasmonic single metal layer and metal-dielectric multilayer nanolenses with resolution exceeding the diffraction limit. Nanolayers of noble metals are evaporated in an e-beam physical vapour deposition machine on smooth substrates at temperatures controlled in the range 90÷300 K. For dielectric nanolayers ion assisted deposition is used. Thin films of Ag are deposited on polished fused silica and sapphire substrates. To reduce island growth substrate cooling and wetting layers are used. Our aim is to find deposition conditions when influence of thermal expansion mismatch on smoothness of deposited layers can be diminished. Quality of surfaces is assessed using standard deviation of average roughness measured with atomic force microscope for films deposited at different rates and different temperatures.
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Tomasz Stefaniuk, Tomasz Stefaniuk, Piotr Wróbel, Piotr Wróbel, Tomasz Szoplik, Tomasz Szoplik, } "Fabrication of plasmonic structures on LN2 cooled substrates", Proc. SPIE 8882, ROMOPTO 2012: Tenth Conference on Optics: Micro- to Nanophotonics III, 88820B (10 June 2013); doi: 10.1117/12.2032350; https://doi.org/10.1117/12.2032350
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