15 October 2013 Getting the most out of your cerium oxide glass polishing slurry: reducing risk and improving performance with plasma produced particles
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Proceedings Volume 8884, Optifab 2013; 88840J (2013) https://doi.org/10.1117/12.2028868
Event: SPIE Optifab, 2013, Rochester, New York, United States
Recent dramatic price volatility and assurance of supply concerns with cerium oxide have left many users of this material in an uncertain and vulnerable position. Since few viable alternatives to ceria for precision glass polishing exist, and much of the supply is very concentrated geographically, technology which conserves ceria, improves absolute removal rate and promotes slurry longevity becomes extremely attractive under these circumstances. Using a plasma-based process to produce cerium oxide confers some unique attributes to the particles which make them particularly well suited for precision glass polishing operations. Many of those same particle characteristics, such as full crystallinity, near theoretical density, very high surface and bulk purity and extremely high zeta potentials in water can also be useful in mitigating the risks associated with a limited and costly ceria supply. This paper will explore how plasma-derived particles, in combination with a high performance chemistry package, can together constitute a fully formulated precision glass polishing slurry with very high activity, extended slurry lifetime, ability to recycle, and excellent overall process economics. Results showing the effect of particle longevity and chemical additives on removal rate and process stability will be discussed in detail, and selected examples which distinguish the benefits of a fully formulated, plasma-derived cerium oxide polishing slurry over conventional milled ceria will be shown.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Patrick G. Murray, Patrick G. Murray, Abigail Hooper, Abigail Hooper, Jason Keleher, Jason Keleher, Jordan Kaiser, Jordan Kaiser, Meghan Nichol, Meghan Nichol, "Getting the most out of your cerium oxide glass polishing slurry: reducing risk and improving performance with plasma produced particles", Proc. SPIE 8884, Optifab 2013, 88840J (15 October 2013); doi: 10.1117/12.2028868; https://doi.org/10.1117/12.2028868


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