Paper
15 October 2013 Nanoscale optical features via hot-stamping of As2Se3 glass
Author Affiliations +
Proceedings Volume 8884, Optifab 2013; 88841T (2013) https://doi.org/10.1117/12.2029274
Event: SPIE Optifab, 2013, Rochester, New York, United States
Abstract
Here we show our ability to fabricate two-dimensional (2D) gratings on chalcogenide glasses with peak-to-valley amplitude of ~200 nm. The fabrication method relies on the thermal nano-imprinting of the glass substrate or film in direct contact with a patterned stamp. Stamping experiments are carried out using a bench-top precision glass-molding machine, both on As2Se3 optically-polished bulk samples and thermally-evaporated thin films. The stamps consist of silicon wafers patterned with sub-micron lithographically defined features. We demonstrate that the fabrication method described here enables precise control of the glass’ viscosity, mitigates risks associated with internal structural damages such as dewetting, or parasitic crystallization. The stamping fidelity as a function of the Time-Force-Temperature regime is discussed, and further developments and potential applications are presented.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sylvain Danto, Erick Koontz, Yi Zou, Tony O. Ogbuu, Benn Gleason, Peter Wachtel, Jonathan D. Musgraves, Juejun Hu, and Kathleen Richardson "Nanoscale optical features via hot-stamping of As2Se3 glass", Proc. SPIE 8884, Optifab 2013, 88841T (15 October 2013); https://doi.org/10.1117/12.2029274
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Cited by 7 scholarly publications.
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KEYWORDS
Glasses

Nanoimprint lithography

Semiconducting wafers

Thin films

Silicon

Scanning electron microscopy

Crystals

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