Paper
14 November 2013 A theoretical analysis for temperature dependences of laser-induced damage threshold
K. Mikami, S. Motokoshi, T. Somekawa, T. Jitsuno, M. Fujita, K. A. Tanaka
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Abstract
The temperature dependence of the laser-induced damage threshold on optical coatings was studied in detail for laser pulses from 123 K to 473 K at different temperature using Nd:YAG laser (wavelength 1064 nm and pulse width 4 ns) and Ti:Sapphire laser (wavelength 800 nm and pulse width 100 fs, 2 ps, and 200 ps). The six kinds of optical monolayer coatings were prepared by electron beam evaporation and the coating materials were SiO2, Al2O3, HfO2, ZrO2, Ta2O5, and MgF2. For pulses longer than a few picoseconds, the laser-induced damage threshold of single-layer coatings increased with decreasing temperature. This temperature dependence was reversed for pulses shorter than a few picoseconds. We describe the physics models to explain the observed scaling. The electron avalanche is essential to explain the differences in the temperature dependence. In other words, the balance between linear process such as electron avalanche etc. and nonlinear process such as multiphoton ionization etc. will be able to decide the tendency of the temperature dependence. The proposed model also gives one of possibility for an extremely high LIDT optics.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
K. Mikami, S. Motokoshi, T. Somekawa, T. Jitsuno, M. Fujita, and K. A. Tanaka "A theoretical analysis for temperature dependences of laser-induced damage threshold", Proc. SPIE 8885, Laser-Induced Damage in Optical Materials: 2013, 88851T (14 November 2013); https://doi.org/10.1117/12.2030180
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KEYWORDS
Picosecond phenomena

Laser induced damage

Silica

Optical coatings

Temperature metrology

Ionization

Laser damage threshold

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