Confocal photothermal microscopy of thin films based on etalon and thermal lensing effects

Z. Sun; A. Mansoori; X. Zhang; L. A. Emmert; D. Patel; C. S. Menoni; W. Rudolph

doi:10.1117/12.2029955

14 November 2013 Confocal photothermal microscopy of thin films based on etalon and thermal lensing effects

Z. Sun, A. Mansoori, X. Zhang, L. A. Emmert, D. Patel, C. S. Menoni, W. Rudolph

Proceedings Volume 8885, Laser-Induced Damage in Optical Materials: 2013; 88851Y (2013) https://doi.org/10.1117/12.2029955
Event: SPIE Laser Damage, 2013, Boulder, Colorado, United States

Abstract

A photothermal apparatus with submicron resolution (~0.5 μm) using a focused 532 nm pump beam is demonstrated. A coaxial probe (633 nm HeNe) detects changes in reflectivity. In addition to detecting modulation of the probes total reflected power caused by perturbation of the Fabry-Perot resonance, a pinhole in confocal geometry detects changes to the probe beam caused by thermal lensing. Based on signal-to-noise measurements made with a film of known absorption, a sensitivity of ~10 ppm is predicted with 200 mW of pump power. The instrument is applied to mapping of local absorption spikes in a Sc₂O₃ film and characterization of laser-induced ripple pattern in a HfO₂ film.

Citation Download Citation

Z. Sun, A. Mansoori, X. Zhang, L. A. Emmert, D. Patel, C. S. Menoni, and W. Rudolph "Confocal photothermal microscopy of thin films based on etalon and thermal lensing effects", Proc. SPIE 8885, Laser-Induced Damage in Optical Materials: 2013, 88851Y (14 November 2013); https://doi.org/10.1117/12.2029955

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