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14 November 2013 Confocal photothermal microscopy of thin films based on etalon and thermal lensing effects
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Abstract
A photothermal apparatus with submicron resolution (~0.5 μm) using a focused 532 nm pump beam is demonstrated. A coaxial probe (633 nm HeNe) detects changes in reflectivity. In addition to detecting modulation of the probes total reflected power caused by perturbation of the Fabry-Perot resonance, a pinhole in confocal geometry detects changes to the probe beam caused by thermal lensing. Based on signal-to-noise measurements made with a film of known absorption, a sensitivity of ~10 ppm is predicted with 200 mW of pump power. The instrument is applied to mapping of local absorption spikes in a Sc2O3 film and characterization of laser-induced ripple pattern in a HfO2 film.
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Z. Sun, A. Mansoori, X. Zhang, L. A. Emmert, D. Patel, C. S. Menoni, and W. Rudolph "Confocal photothermal microscopy of thin films based on etalon and thermal lensing effects", Proc. SPIE 8885, Laser-Induced Damage in Optical Materials: 2013, 88851Y (14 November 2013); https://doi.org/10.1117/12.2029955
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