Characterization and application of HfO2 - SiO2 mixtures produced by ion-beam sputtering technology

S. Kičas; Gintarė Batavičiūtė; Kęstutis Juškevičius; Tomas Tolenis; Ramutis Drazdys; Rytis Buzelis; Andrius Melninkaitis

doi:10.1117/12.2030308

14 November 2013 Characterization and application of HfO₂ - SiO₂ mixtures produced by ion-beam sputtering technology

S. Kičas, Gintarė Batavičiūtė, Kęstutis Juškevičius, Tomas Tolenis, Ramutis Drazdys, Rytis Buzelis, Andrius Melninkaitis

Author Affiliations +

Proceedings Volume 8885, Laser-Induced Damage in Optical Materials: 2013; 888521 (2013) https://doi.org/10.1117/12.2030308
Event: SPIE Laser Damage, 2013, Boulder, Colorado, United States

Abstract

In the past years the usage of mixed oxides coatings lead to an important improvement of laser damage threshold and quality of optical elements. In this study influence of post treatment procedure - ex-situ annealing - is examined in terms of quality, optical constants and laser induced damage threshold (LIDT) of mixed HfO₂ and SiO₂ coatings. Monolayer thin films containing different fractions of HfO₂ are deposited with ion beam sputtering technology (IBS.) All samples are post annealed at different temperatures and optimal regimes are defined. Refractive index and absorption coefficient dispersion is evaluated from transmission spectra measurements. Surface roughness of all samples is characterized before and after deposition and annealing, using atomic force microscopy (AFM). Microstructural changes are identified from changes in surface topography. Further, optical resistance was characterized by 5.7 ns duration pulses for 355 nm wavelength laser radiation, performing 1-on-1 sample exposure tests with high resolution micro-focusing approach for monolayer samples and S-on-1 tests for multilayer reflectors. Morphology of damaged sites was analyzed through optical microscopy. Finally, conclusions about annealing effect for mixed HfO₂ and SiO₂ monolayer and multilayer coatings are made.

Citation Download Citation

S. Kičas, Gintarė Batavičiūtė, Kęstutis Juškevičius, Tomas Tolenis, Ramutis Drazdys, Rytis Buzelis, and Andrius Melninkaitis "Characterization and application of HfO₂ - SiO₂ mixtures produced by ion-beam sputtering technology", Proc. SPIE 8885, Laser-Induced Damage in Optical Materials: 2013, 888521 (14 November 2013); https://doi.org/10.1117/12.2030308

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE