Localized planarization of optical damage using laser-based chemical vapor deposition

Manyalibo J. Matthews; Selim Elhadj; Gabe M. Guss; Arun Sridharan; Norman D. Nielsen; Jae-Hyuck Yoo; Daeho Lee; Costas Grigoropoulos

doi:10.1117/12.2030506

25 November 2013 Localized planarization of optical damage using laser-based chemical vapor deposition

Manyalibo J. Matthews; Selim Elhadj; Gabe M. Guss; Arun Sridharan; Norman D. Nielsen; Jae-Hyuck Yoo; Daeho Lee; Costas Grigoropoulos

Author Affiliations +

Proceedings Volume 8885, Laser-Induced Damage in Optical Materials: 2013; 888526 (2013) https://doi.org/10.1117/12.2030506
Event: SPIE Laser Damage, 2013, Boulder, Colorado, United States

Abstract

We present a method to repair damaged optics using laser-based chemical vapor deposition (L-CVD). A CO₂ laser is used to heat damaged silica regions and polymerize a gas precursor to form SiO₂. Measured deposition rates and morphologies agree well with finite element modeling of a two-phase reaction. Along with optimizing deposition rates and morphology, we also show that the deposited silica is structurally identical to high-grade silica substrate and possesses high UV laser damage thresholds. Successful application of such a method could reduce processing costs, extend optic lifetime, and lead to more damage resistant laser optics used in high power applications.

Citation Download Citation

Manyalibo J. Matthews, Selim Elhadj, Gabe M. Guss, Arun Sridharan, Norman D. Nielsen, Jae-Hyuck Yoo, Daeho Lee, Costas Grigoropoulos, "Localized planarization of optical damage using laser-based chemical vapor deposition", Proc. SPIE 8885, Laser-Induced Damage in Optical Materials: 2013, 888526 (25 November 2013); doi: 10.1117/12.2030506; https://doi.org/10.1117/12.2030506

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