25 November 2013 Localized planarization of optical damage using laser-based chemical vapor deposition
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We present a method to repair damaged optics using laser-based chemical vapor deposition (L-CVD). A CO2 laser is used to heat damaged silica regions and polymerize a gas precursor to form SiO2. Measured deposition rates and morphologies agree well with finite element modeling of a two-phase reaction. Along with optimizing deposition rates and morphology, we also show that the deposited silica is structurally identical to high-grade silica substrate and possesses high UV laser damage thresholds. Successful application of such a method could reduce processing costs, extend optic lifetime, and lead to more damage resistant laser optics used in high power applications.
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Manyalibo J. Matthews, Manyalibo J. Matthews, Selim Elhadj, Selim Elhadj, Gabe M. Guss, Gabe M. Guss, Arun Sridharan, Arun Sridharan, Norman D. Nielsen, Norman D. Nielsen, Jae-Hyuck Yoo, Jae-Hyuck Yoo, Daeho Lee, Daeho Lee, Costas Grigoropoulos, Costas Grigoropoulos, "Localized planarization of optical damage using laser-based chemical vapor deposition", Proc. SPIE 8885, Laser-Induced Damage in Optical Materials: 2013, 888526 (25 November 2013); doi: 10.1117/12.2030506; https://doi.org/10.1117/12.2030506


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