1 October 2013 Scanner grid recipe creation improvement for tighter overlay specifications
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Proceedings Volume 8886, 29th European Mask and Lithography Conference; 888608 (2013) https://doi.org/10.1117/12.2030186
Event: 29th European Mask and Lithography Conference, 2013, Dresden, Germany
Abstract
Overlay specifications are tightening with each lithography technology node. As a result, there is a need to improve overlay control methodologies to make them more robust and less time- or effort-consuming, but without any compromise in quality. Two concepts aimed at improving the creation of scanner grid recipes in order to meet evertightening overlay specifications are proposed in this article. Simulations will prove that these concepts can achieve both goals, namely improving overlay control performance and reducing the time and effort required to do so. While more studies are needed to fine-tune the parameters to employ, the trends presented in this paper clearly show the benefits.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eric Cotte, Eric Cotte, Hariharasudhan Kathiresan, Hariharasudhan Kathiresan, Matthias Ruhm, Matthias Ruhm, Bernd Schulz, Bernd Schulz, Uwe Schulze, Uwe Schulze, } "Scanner grid recipe creation improvement for tighter overlay specifications", Proc. SPIE 8886, 29th European Mask and Lithography Conference, 888608 (1 October 2013); doi: 10.1117/12.2030186; https://doi.org/10.1117/12.2030186
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