25 July 2013 Wide band antireflective coatings Al2O3 / HfO2 / MgF2 for UV region
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Proceedings Volume 8902, Electron Technology Conference 2013; 890228 (2013) https://doi.org/10.1117/12.2030511
Event: Electron Technology Conference 2013, 2013, Ryn, Poland
Abstract
Deposition technology of the three layers antireflective coatings consists of hafnium compound are presented in this paper. Oxide films were deposited by means of e-gun evaporation in vacuum of 5x10-5 mbar in presence of oxygen and fluoride films by thermal evaporation. Substrate temperature was 250°C. Coatings were deposited onto optical lenses made from quartz glass (Corning HPFS). Thickness and deposition rate were controlled by thickness measuring system Inficon XTC/2. Simulations leading to optimization of thickness and experimental results of optical measurements carried during and after deposition process were presented. Physical thickness measurements were made during deposition process and were equal to 43 nm/74 nm/51 nm for Al2O3 / HfO2 / MgF2 respectively. Optimization was carried out for ultraviolet region from 230nm to the beginning of visible region 400 nm. In this region the average reflectance of the antireflective coating was less than 0.5% in the whole range of application.
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P. Winkowski, P. Winkowski, Konstanty W. Marszałek, Konstanty W. Marszałek, } "Wide band antireflective coatings Al2O3 / HfO2 / MgF2 for UV region", Proc. SPIE 8902, Electron Technology Conference 2013, 890228 (25 July 2013); doi: 10.1117/12.2030511; https://doi.org/10.1117/12.2030511
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