10 October 2013 Development and measurement of single layer thickness standard
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Proceedings Volume 8916, Sixth International Symposium on Precision Mechanical Measurements; 891634 (2013) https://doi.org/10.1117/12.2035503
Event: Sixth International Symposium on Precision Mechanical Measurements, 2013, Guiyang, China
Abstract
To study the different measurement results come from different kinds of instruments for the thin film thickness measurement, a serial of the thin film thickness standard samples with single layer are developed, these thickness values are about from 5 nm to more than 100 nm. These standard samples designed specially can be calibrated by X- ray reflectometry, and also can be calibrated by some kinds of 3D surface profiler including some non-contact optical profilometers, stylus contact surface profilometers and scanning probe microscopies, because some specific film graphs are made in some zones on the layer. It is fund through some measure experiments comparison done that the film thickness measurement uncertainty is small than 1nm by X- ray reflectometry, and more than 2~10 nm by other measurement instruments. And then, to analyze the reasons for different measure methods have different values and uncertainties for the same layer thickness standard, such as the unperfected graphs influence of film thickness on the standard samples and the size and shape of probe tip for contact measure instrument, even including the difference of performance of the measure systems and computational approaches to the film thickness.
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Jianjun Cui, Sitian Gao, Hua Du, Xiaoping Zhu, Liping Yan, "Development and measurement of single layer thickness standard", Proc. SPIE 8916, Sixth International Symposium on Precision Mechanical Measurements, 891634 (10 October 2013); doi: 10.1117/12.2035503; https://doi.org/10.1117/12.2035503
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